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A Novel Reflectometer for Relative Reflectance Measurements of CCDs

机译:一种用于CCD相对反射测量的新型反射仪

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摘要

The high quantum efficiencies (QE) of backside illuminated charge coupleddevices (CCD) has ushered in the age of the large scale astronomical survey.The QE of these devices can be greater than 90 %, and is dependent upon theoperating temperature, device thickness, backside charging mechanisms, andanti-reflection (AR) coatings. But at optical wavelengths the QE is wellapproximated as one minus the reflectance, thus the measurement of the backsidereflectivity of these devices provides a second independent measure of theirQE. We have designed and constructed a novel instrument to measure the relativespecular reflectance of CCD detectors, with a significant portion of thisdevice being constructed using a 3D fused deposition model (FDM) printer. Thisdevice implements both a monitor and measurement photodiode to simultaneouslycollect incident and reflected measurements reducing errors introduced by therelative reflectance calibration process. While most relative reflectometersare highly dependent upon a precisely repeatable target distance for accuratemeasurements, we have implemented a method of measurement which minimizes theseerrors. Using the reflectometer we have measured the reflectance of two types ofHamamatsu CCD detectors. The first device is a Hamamatsu 2k x 4k backsideilluminated high resistivity p-type silicon detector which has been optimizedto operate in the blue from 380 nm - 650 nm. The second detector being a 2k x4k backside illuminated high resistivity p-type silicon detector optimized foruse in the red from 640 nm - 960 nm. We have not only been able to measure thereflectance of these devices as a function of wavelength we have also sampledthe reflectance as a function of position on the device, and found a reflectiongradient across these devices.
机译:背照式电荷耦合器件(CCD)的高量子效率(QE)迎来了大规模天文测量的时代,这些器件的QE可以大于90%,并且取决于工作温度,器件厚度,背面充电机制和减反射(AR)涂层。但是在光波长处,QE很好地近似为一个反射率减去反射率,因此,这些设备的背面反射率的测量提供了其QE的第二个独立度量。我们设计并构建了一种新颖的仪器来测量CCD检测器的相对镜面反射率,其中很大一部分是使用3D熔融沉积模型(FDM)打印机构建的。该设备同时实现了监控光电二极管和测量光电二极管,以同时收集入射和反射测量值,从而减少了相对反射率校准过程引入的误差。尽管大多数相对反射仪高度依赖于精确可重复的目标距离来进行精确测量,但我们已经实现了一种将这些误差最小化的测量方法。使用反射计,我们测量了两种类型的滨松CCD检测器的反射率。第一个设备是Hamamatsu 2k x 4k背照式高电阻率p型硅探测器,该探测器已经过优化,可在380 nm至650 nm的蓝色范围内工作。第二个检测器是2k x4k背面照亮的高电阻率p型硅检测器,已优化用于640 nm-960 nm的红色。我们不仅能够测量作为波长函数的这些设备的反射率,而且还对作为设备上位置的函数的反射率进行了采样,并发现了这些设备之间的反射梯度。

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